IPNEX

Licensable university IP

Methods for the fabrication of graphene nanoribbon arrays using block copolymer lithography

Methods for the fabrication of graphene nanoribbon arrays using block copolymer lithography is marketed for licensing by Wisconsin Alumni Research Foundation. It is documented in US patent US 9,105,480. The current assignee of record is Wisconsin Alumni Research Foundation. Google Patents reports its legal status as “Active” (an automated indicator, not a legal determination). Its expected expiration is 2033-07-21.

Patent picture

FieldValueReliabilitySource
US patentUS 9,105,48095%HighGoogle Patents
Patent titleMethods for the fabrication of graphene nanoribbon arrays using block copolymer lithography90%HighGoogle Patents
Current assigneeWisconsin Alumni Research Foundation80%GoodGoogle Patents
Original assigneeWisconsin Alumni Research Foundation85%GoodGoogle Patents
Legal statusActive70%ModerateGoogle Patents
Filing date2013-03-1490%HighGoogle Patents
Priority date2013-03-1490%HighGoogle Patents
Publication date2015-08-1190%HighGoogle Patents
Expected expiration2033-07-2175%ModerateGoogle Patents
Reliability of each field, at a glance:
  • High 90% and up
  • Good 80 to 89%
  • Moderate 70 to 79%
Hover a bar for the exact figure; the Source column links the citation.

Legal status is Google Patents' automated indicator, not a legal determination.

Joined to US 9,105,480 by its printed patent number (a deterministic match), then enriched from public Google Patents data. Fields are shown only where resolved against a public source; unresolved fields are omitted, never guessed.

Original listing

This technology is marketed for licensing by Wisconsin Alumni Research Foundation. View the original listing.